Dielectric materials are of critical importance in the function of microelectronic devices. This article outlines why and the mechanical characterization of Ultra Low-k Dielectric Films.
Thermally conductive ultra-low-k dielectric layers based on two-dimensional covalent organic frameworks
Capacitor Fundamentals: Part 8 – Dielectric Classifications
Dielectric Materials
Bruker Nano Surfaces and Metrology : Quotes, Address, Contact
Molecular Beam Epitaxy
Surface-Localized Sealing of Porous Ultralow-k Dielectric Films with Ultrathin (<2 nm) Polymer Coating.
Low-K Films (Low Dielectric Films) - Silicon Valley Microelectronics
Low-Dk PCB Materials
Bruker Nano Surfaces and Metrology : Quotes, Address, Contact
Understanding Capacitor Types and Characteristics
Modification of Porous Ultralow-k Film by Vacuum Ultraviolet Emission
NOVEL SILICON PRECURSORS TO MAKE ULTRA LOW-K FILMS OF K<2.2 WITH HIGH MECHANICAL PROPERTIES BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION - Eureka
Mechanical Characterization Of Ultra Low-k Dielectric Films
Layered Foam/Film Polymer Nanocomposites with Highly Efficient EMI Shielding Properties and Ultralow Reflection
Porous Low-Dielectric-Constant Material for Semiconductor Microelectronics